CMP Cross
Achieving high flatness with high durability for CMP cloth! Introduction to CMP cloth.
"CMP Cross" is a cloth for CMP made by bonding polyurethane to a non-woven fabric composed of special polyester fibers. It achieves high flatness on the processing surface and high durability of the cloth, making it possible to perform polishing based on the backside of the substrate for mirror finishing of compound semiconductors and removal of oxide films. It is also suitable for the final process in polishing and for mirror finishing of edges. 【Features】 ■ Non-woven fabric made from special polyester fibers bonded with polyurethane ■ Achieves high flatness on the processing surface and high durability of the cloth ■ Suitable for use in the final process of polishing ■ Enables polishing based on the backside of the substrate ■ Removes fine scratches that cannot be eliminated in the polishing process of polishing cloths *For more details, please refer to the PDF document or feel free to contact us.
- Company：ムサシノ電子
- Price：10,000 yen-100,000 yen
